Since summer 2024, the NanoMAX imaging endstation (EH1) uses a fixed KB-mirror system to create a nano-focused beam. The two mirrors with matching numerical aperture create a symmetric diffraction limited focus in the shape of two crossed one-dimensional sinc functions.

Nanomax Beam Img 12kev

Beam size and intensity

The coherent flux / beam intensity and focal spot size at the NanoMAX imaging endstation (EH1) depend on the photon energy of the X-ray beam. The highest flux of about 1.e11 photons per second, can be achieved at 8 keV. Towards both lower and higher photon energies from this optimum, the provided flux is reduced. Down to 6 keV and up to 15 keV, the flux is above or equal to 1.e.10 photons per second. Beyond 15 keV, the mirrors do not work in the total reflection regime anymore and the beam intensity is strongly reduced.

Nanomax Img Flux
Nanomax Img Focus Sizes

Depending on the method and sample it is possible, that not all of the available photons can be used, as the resulting signal strength could blind and damage the detectors. In such cases the primary beams intensity could be reduced by either inserting absorbers upstream of the mirrors or by closing the secondary source aperture beyond the setting needed for a coherent illumination of the mirrors. The later ensures a consistent beam quality.

With the mirrors design parameters (below) the following numbers for the diffraction limited focal spot size, depth of field and secondary source aperture size settings for a coherent illumination could be calculated:

photon energy [keV]6789101112131415
focal spot size [nm]78.7 67.559.052.547.242.939.436.333.731.5
depth of field [μm]120.0102.890.080.072.065.460.055.451.448.0

Hardware

The vertically focusing mirror (VFM) and horizontally focusing mirror are both made from single crystal silicon in shape of a elliptical cylinder. The design parameters of the two mirrors are listed in the following table:

VFMHFM
Mirror materialSingle crystal siliconSingle crystal silicon
Substrate shapeElliptical cylinderElliptical cylinder
Reflection directionDownwardRightward
distance from source34.300 m34.420 m
distance to focus0.200 m0.080 m
distance between mirrors0.005 m
free distance after HFM0.045 m
substrate length0.160 m0.070 m
active mirror length0.150 m0.060 m
incidence angle3.5 mrad3.5 mrad

From the design parameters above, the following parameters can be calculated:

VFMHFM
distance from source to mirror center34.300 m34.420 m
focal length0.200 m0.080 m
acceptance aperture525 μm210 μm
acceptance angle15.3 μrad6.1 μrad
numerical aperture (NA)1.312 mrad1.312 mrad