The photon source of the FinEstBeAMS beamline is an Elliptically Polarizing Undulator (EPU).
|Magnetic structure||95.2 mm period, 26 periods,
14 mm minimal gap, 2.475 m magnetic length, maximum magnetic field 1.13 T
|Design||APPLE II design with permanent magnets|
|Energy (wavelength) range||4.5 - 1300 eV|
|Polarization||Linear, circular and elliptical|
The optical layout of the FinEstBeAMS beamline is based on the plane grating monochromator illuminated with collimated light.
|Collimating optics||Side cooled toroidal collimating mirror|
|Monochromator (cPGM)||Collimating plane grating monochromator with 2 plane gratings (92 and 600 mm/l) , internally cooled plane mirror
|Focusing optics||Toroidal mirrors. Focusing mirrors are used to switch the beam between branch lines by moving one or other one in front of the beam path.|
|Exit slit||Rectangular high precision slits|
|Re-focusing optics||Single ellipsoidal mirror|
|Photon resolution||ΔE/E up to 1 x 10E-4 (~2.3 meV at 10 eV, ~3.8 meV at 50 eV , ~40 meV at 400 eV)
|Flux at sample (focused)||10E9 - 10E13 ph/s (4.5 – 1300 eV) for E/ΔE~5000 (Maximum flux is measured around 100 eV.)
|Beam size at sample||200 x 200 μm2 (horizontal x vertical), 50 x 50 μm2 when limiting exit slit and baffles