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Nano-focused X-rays aid integrated circuit development

A modern chip contains billions of transistors. The size of individual features is just a couple of tens of nanometres. With decreasing size follows increased demands on material control and characterisation down to the atomic scale. The nano-focused X-ray beam at beamline NanoMAX prove to be a useful tool for investigating electromigration, a significant cause of failure in on-chip interconnects.

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