General information

SR beam spot size100 µm x 100 µm
Pressure range for XPS measurementsUHV to 20 mbar
AnalyserSPECS Phoibos 150 NAP
Energy range30 to 1500 eV

The SPECIES APXPS endstation is designed for ambient-pressure XPS measurements using dedicated cells. The endstation is equipped with UHV manipulator to facilitate normal measurements in UHV conditions with sample heating and typical sample preparation methods. Dedicated ambient pressure cells enable measurements to be carried out at higher gas pressures. Below we describe the endstation in detail.

Analysis chamber

Base pressure5e-10 mbar
Sample manipulationX, Y, Z, rot (UHV manipulator)
X, Y, Z (AP cells)
X-ray sourcesEPU61 and
SPECS XR50 with Mg and Al anodes, 250 W power (unmonochromatized and unfocused)
Sample storageGarage with three slots

Ambient pressure XPS

Max pressure20 mbar
Max temperatureUp to ~600 C with resistive heating (button heater) (PID control)
Min temperature-30 C with LN2 cooling
SR incidence angle57 deg with respect to analyser
Electron detection angleNormal to surface
Analyser apertures (with AP cells)0.3 mm, 0.5 mm, 1.0 mm
QMSDycor LCD200 up to 200 amu range
Can sample cell inlet and outlet
Gas dosingCurrent status: Up to two independent gases
Under construction/validation: Two gas mixing panels for a total of 8 gases
Controlled atmosphere load-lockUnder construction
Standard cellAvailable for users
Sulphur cellCell under commissioning. Gas system under construction
ALD cellUnder construction/commissioning.

UHV XPS

Max pressure1e-5 mbar (backfilling mode)
Min pressure2e-10 mbar
Max temperature Up to ~1000 C with e-beam heating (PID control)
SR incidence angle57 deg with respect to analyzer
Electron emission angleVariable

Analyser

TypeSPECS Phoibos 150 NAP with differentially pumped lens system
Energy resolution< 10 meV, depending on applied settings
Kinetic energy range0 to 3.5 keV
DetectorDelay line detector (Surface Concept).
ModesTransmission (medium and small area), angular
SoftwareSpecsLab Prodigy

Preparation chamber

Base pressure2e-10 mbar
UHV manipulatorX, Y, Z and rotation
HeatingUp to 1000 C (e-beam heater with PID control)
CoolingAir cooling of sample stage
Sputter gunSPECS Ar Sputter gun
LEEDSPECS ErLEED
Evaporation sourceFocus EFM 3T triple cell evaporator
GasesPossibility to leak in several gases
ElectrosprayAvailable upon special request
Available ports for user equipmentPort size: DN40CF with a manual gate valve (no need of venting preparation chamber for installation)

Load lock

Base pressure2e-8
Sample holderFlag style
Sample sizeApproximately 8 mm x 8 mm (see image below)
Transfer time30 min (from air)

Species uses flag style samples with a modified thermocouple design: