X-ray source (EPU)Elliptically polarising undulator (APPLE-II type), 48 mm period,
1st harmonic 173-1650 eV
Energy range275 – 2500 eV, using 1st and 3rd harmonic of the EPU
Vertically collimating mirror (M1)At 24 m, 1° incidence angle, Au & Rh-coated, cylindrical, water-cooled
Monochromator (c-PGM)At 26 m, plane grating monochromator,
1200 l/mm, blaze 1°, Au & Rh coating
(300 l/mm, blaze 0.6°, TBI)
Energy resolution≥ 5000 E/ΔE, and ≥ 10 000 for E<1000 eV (1200 l/mm)
First focusing mirror (M3)CXI: 28.8 m, 1° incidence angle, toroidal, Au-coated
STXM: 30.5 m, 1° incidence angle, toroidal double mirror, Rh & Au-coated
Secondary source (ES)At 40.8 m – CXI
At 38.5 m – STXM
Refocusing opticsCXI: Kirkpatrick-Baez (KB) super-polished plane elliptical mirror pair,
inc. angle 1°, Au-coated, at 46.1 & 46.5m (M4, M5)
STXM: Fresnel zone plate (ZP), normal incidence, various sizes
Beam size at sample At 48.7 m - CXI: 20 x 20 μm^2 (FWHM, horizontal x vertical)
At 43.5 m - STXM: 10 – 100 nm diameter depending on ZP used
Flux at sample (focused spot)CXI: from 8 x 10^12 – 1 x 10^12 up to 2200 eV, in 20 μm^2 spot
STXM: between 1 x 109 (2500 eV) – 1 x 1012 (275) ph/s
(in 25 nm spot)
Experiment: techniques and
set-up
CXI: holography & resonant soft x-ray (magnetic) scattering set up with 2D detector or diode on in-plane goniometer in vacuum chamber
STXM: scanning transmission x-ray microscope, with fluorescence detector and 2D detector for ptychography, fast scanning